Stamp collapse in soft lithography.

نویسندگان

  • Yonggang Y Huang
  • Weixing Zhou
  • K J Hsia
  • Etienne Menard
  • Jang-Ung Park
  • John A Rogers
  • Andrew G Alleyne
چکیده

We have studied the so-called roof collapse in soft lithography. Roof collapse is due to the adhesion between the PDMS stamp and substrate, and it may affect the quality of soft lithography. Our analysis accounts for the interactions of multiple punches and the effect of elastic mismatch between the PDMS stamp and substrate. A scaling law among the stamp modulus, punch height and spacing, and work of adhesion between the stamp and substrate is established. Such a scaling law leads to a simple criterion against the unwanted roof collapse. The present study agrees well with the experimental data.

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عنوان ژورنال:
  • Langmuir : the ACS journal of surfaces and colloids

دوره 21 17  شماره 

صفحات  -

تاریخ انتشار 2005